Compositional and Structural Analysis of Al-doped ZnO Multilayers by LEAP
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چکیده
Atomic layer deposition (ALD) is a technique that uses a cyclical exposure and purging of chemical precursors to create thin films. ALD offers a high degree of control over the thickness and composition of the films. The technique is generally used for binary compounds such as oxide and nitrides. ZnO is grown by ALD as a transparent conductive oxide for photovoltaic and optoelectronic applications.
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تاریخ انتشار 2014